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Tetramethylammonium hydroxide solution (25 wt. % solution in methanol) may be used in the synthesis of zirconium oxides via a modified sol-gel method with potential as catalyst materials in CO hydrogenation.
T 1476 (OTTO) Tetramethylammonium hydroxide 25% in methanol - used as a basic solvent in the development of acidic photoresist in the photolithography process, and is highly effective in stripping photoresist.
KOH and TMAH are anisotropic silicon etches, used to make V-grooves, membranes, and holes through wafers, as well as other devices. ... KOH is simply the hydroxide of potassium. TMAH is a organic hydroxide and stands for Tetramethyl ammonium hydroxide.
Tetramethylammonium hydroxide is used for anisotropic etching of silicon. As a basic solvent, it is used in the development of acidic photoresist in the photolithography process. It acts as phase transfer catalyst and surfactant and is used in the synthesis of ferrofluid in order to inhibit nanoparticle aggregation.